Defect Recognition and Image Processing in Semiconductors 1997

Proceedings of the seventh conference on Defect Recognition and Image Processing, Berlin, September 1997

af J. Doneker

Presents an overview of techniques used to assess, monitor, and characterize defects from the atomic scale to inhomogeneities in complete silicon wafers. This book addresses advances in defect analyzing techniques and instrumentation and their application to substrates, epilayers, and devices. It investigates defects in layers and devices.